OUR LABS AND EQUIPMENT

Two large laboratory rooms: Spectroscopy and Materials labs.
Main equipment is,

• Tunable OPO Laser System (220 nm- 2000 nm).
• Millennia Nd:YVO Laser (532 nm) CW.
• Ti: Sapphire Laser (650 nm – 980 nm) CW, Power 1W
• Nd:YAG Laser (1064 nm, 532 nm & 355 nm) Pulsed (10 ns), Energy 1.5 J (1064 nm), 700 mJ (532 nm), 450 mJ (355 nm).
• Nitrogen laser (337 nm) Pulsed (0-30 Hz, 4 ns), Energy 300 μJ.
• Xenon Arc Lamp CW, 150 W.
• Semiconductor laser at 375 nm, 9 mW energy.
• Optical tables
• Spectrophotometer UV-VIS-NIR.
• Spectrometer (500 mm focal distance, UV-VIS-NIR).
• Oscilloscope (500 MHz Bandwidth, 2 Channels).
• PMT Detectors (UV-VIS-NIR).
• Photodiodes. Viewer UV, VIS, IR.
• ICCD, 280-950nm with 5 ns.
• Lock-in Amplifier.
• Rotary Evaporator.
• Photon Counter.
• Potenciostat - Galvanostat.
• Thin-Film Measurement System.
• Atomic Force Microscope (AFM) and scanning tunneling microscope (STM).
• Vacuum Deposition System + Glove Boxes.
• O2 and N2 plasma system cleaner.
• Solar simulator.
• Micro-ondas para síntesis orgánica.
• Digital optical microscope.
• Doctor blade system.
• Slot die system.

To measure the electric, optical and morphological properties of samples, additional facilities and techniques can be used such as J-V curves, IPCE (EQE), IQE, LIBS, AFM / STM, impedance, cyclic voltammetry, high resolution optical microscopy, calculation of series resistors and in parallel (single diode model), 4-point method, etc. Furthermore, general facilities at CIO, i.e., SEM, EDS-SEM, STEM, XRD, etc.; electronics workshop and opto-mechanical design, Raman, fluorimeter, etc. can be used.

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